Talbot Lithography Simulator


Talbot Lithography is a semiconductor process, which is used for fabrication a sub-micron features in non-contact fashion. This type of lithography uses the light diffraction in the near field (Talbot Effect) for creation a resist image. The example of so called ‘Talbot Carper’ is presented on rigth side image.

Due to high complexity of full fabrication process, which includes optical exposure and chemical development, a software which can simulate the Talbot Lithography will reduce time and cost of prototyping semiconductors devices.



  • support for an arbitrary mask of two types: amplitude or phase,
  • output of Talbot Carpet,
  • output of an optical aerial image at specific position and for predefined integration distance,
  • calculation of a latent image in photo-resist after exposition ( Dill model ),
  • simulation of the development process of the photo-resist ( Notch model ).


Programming skills:

  • Matlab
  • Optimisation of memory management
  • Design User Interface (UI)



Fig. (Left) Latent image of resist after exposure; (Middle) Final resist representation after short development time; (Right) Final resist representation after long development time.


Papers related to this work:

  • E.D. Le Bouldbar, P. J. P. Chausse, S. M. Lis, P. A. Shields, “Displacement Talbot lithography: an alternative technique to fabricate nanostructured metamaterials “, Proc. of SPIE Vol. 10248 102480Q-1 (2017)